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On the nature of the interfacial layer in ultra-thin TiN/LaLuO3 gate stacks
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10.1063/1.4746790
/content/aip/journal/jap/112/4/10.1063/1.4746790
http://aip.metastore.ingenta.com/content/aip/journal/jap/112/4/10.1063/1.4746790
/content/aip/journal/jap/112/4/10.1063/1.4746790
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/content/aip/journal/jap/112/4/10.1063/1.4746790
2012-08-21
2014-07-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: On the nature of the interfacial layer in ultra-thin TiN/LaLuO3 gate stacks
http://aip.metastore.ingenta.com/content/aip/journal/jap/112/4/10.1063/1.4746790
10.1063/1.4746790
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