X-ray diffraction patterns of randomly oriented and (111) textured 110 nm-thick NFO films deposited on Si and Si/SiO2/TiOx/Pt substrates.
Top-view and cross-sectional SEM images of (a) and (c) randomly oriented and (b) and (d) (111) textured 110 nm-thick NFO films deposited on Si and Si/SiO2/TiOx/Pt substrates.
X-ray pole figures of (a) randomly oriented Si-NFO and (b) and (c) (111) textured Pt-NFO films. The fixed 2θ angles are associated with (222) [(a) and (b)] and (440) (c) peaks. All films are 110 nm-thick.
X-ray diffraction patterns of (111) textured NFO films on Si/SiO2/TiOx/Pt substrates as a function of NFO thickness.
TEM images of (a) plan view and (b) cross-sectional view of Si/NFO. The inset shows the electron diffraction pattern of the film and substrate.
TEM images of (111) textured NFO on Si/SiO2/TiOx/Pt; (a) top-view TEM image and its selected area electron diffraction pattern (inset), (b) the dark field diffraction contrast image corresponding to (111) diffraction, and (c) cross-sectional view.
(a) Room temperature in-plane and out-of-plane magnetization hysteresis for 50 nm-thick textured NFO on Si/SiO2/TiOx/Pt and (b) room temperature out-of-plane magnetization hysteresis for random and textured NFO films of different thicknesses.
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