AFM images of diblock copolymers (a) after spin-coating on Si; (b) after THF ordering; (c) after ethanol exposure; (d) after deposition of 10 nm Al. Top insets show the corresponding FFT patterns.
AFM images of 45 nm Nd-Co/template sample: (a) height image (b) phase image.
MOTKE in-plane hysteresis loops of 52 nm Nd-Co films with (a) H along in-plane easy axis and (b) H along in plane hard axis: solid line, Nd-Co/template; dotted line, Nd-Co/Si(100). (c) Thickness dependence of easy axis remanent magnetization of NdCo films: squares, Nd-Co/Si; triangles, NdCo/template. Inset shows the in-plane angular dependence of MR/MS for 45 nm NdCo/Si (circles) and 45 nm Nd-Co/template (rhombs). Angles are measured from the in-plane easy axis. Solid line corresponds to the behavior of in-plane uniaxial anisotropy MR/MS = cos θ.
MFM images during a hard axis magnetization process: (a)-(c) 45 nm Nd-Co/Si(100) and (d)-(f) 45 nm Nd-Co/template. Arrows indicate applied field direction and in-plane easy axis.
EHE out-of-plane hysteresis loops measured at 10 K: (a) 45 nm Nd-Co/Si(100), (b) 45 nm Nd-Co/template.
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