Magnetic hysteresis loops of (a) sample A and (b) sample B with geometry shown in the inset (arrows indicate applied field directions).
Nanoindentation measurements for sample A; (a) hardness and (b) reduced elastic modulus.
Nanoindentation measurements for sample B; (a) hardness and (b) reduced elastic modulus.
Ramp loading nanoscratch test; (a) load-displacement profile and (b) schematic of residual scratch formulation.
Mechanical and magnetic degradation during a ramp loading nanoscratch experiment.
Constant loading nanoscratch test; (a) load-displacement profile and (b) schematic of residual scratch formulation.
Representative images for sample A after ramp loading nanoscratch test; (a) AFM and (b) MFM.
Representative images for sample A after constant loading nanoscratch test; (a) AFM and (b) MFM.
The residual scratch measurements from AFM and MFM; (a) residual scratch length after ramp loading nanoscratch and (b) residual scratch width after constant loading nanoscratch.
Schematic of contact stress distribution during sliding contact; (a) stresses in side view and (b) top view.
Von Mises stresses during constant loading nanoscratch with the contact force of 500 μN; (a) sample A and (a) sample B.
Schematic of the prevailing pile-up material behavior in both sides of sliding track.
Measured magnetic properties of the permalloy films at sweep frequency of 10 Hz.
Rate of mechanical and magnetic degradation of scratches by constant and ramp loads on the magnetic film samples.
Input material properties of the tip and magnetic film samples. E and ν denote the Young's modulus and Poisson's ratio.
Critical load and von Mises stress to initiate material degradation.
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