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The formation of Ti–O tetrahedra and band gap reduction in SiO2 via pulsed ion implantation
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10.1063/1.4795262
/content/aip/journal/jap/113/10/10.1063/1.4795262
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/10/10.1063/1.4795262
/content/aip/journal/jap/113/10/10.1063/1.4795262
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/content/aip/journal/jap/113/10/10.1063/1.4795262
2013-03-13
2014-11-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: The formation of Ti–O tetrahedra and band gap reduction in SiO2 via pulsed ion implantation
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/10/10.1063/1.4795262
10.1063/1.4795262
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