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Response to “Comment on ‘A model for internal photoemission at high-k oxide/silicon energy barriers’” [J. Appl. Phys. 113, 166101 (2013)]
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/content/aip/journal/jap/113/16/10.1063/1.4802675
2013-04-29
2014-10-23

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Scitation: Response to “Comment on ‘A model for internal photoemission at high-k oxide/silicon energy barriers’” [J. Appl. Phys. 113, 166101 (2013)]
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/16/10.1063/1.4802675
10.1063/1.4802675
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