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AFM images (2 × 2 μm2) for (a) a bare PET substrate, (b) FeGa(20 nm)/PET, (c) FeGa(50 nm)/PET, and (d) FeGa(50 nm)/Ta(10 nm)/PET films. The color contrast (dark to bright) for the height scale corresponds to 30 nm. (e) RMS roughness versus Ta buffer layer thickness for FeGa(20 nm)/Ta(t Ta)/PET and FeGa(50 nm)/Ta(t Ta)/PET films.
Hysteresis loops for flexible FeGa(50 nm)/Ta(t Ta)/PET films with a magnetic field applied along (a) the easy (ψ = 0°) and (b) hard (ψ = 90°) axes, and the corresponding angular dependence of (c) squareness and (d) coercive field.
Hysteresis loops for FeGa(50 nm)/PET taken with magnetic field along the (a) easy and (b) hard axes and FeGa(50 nm)/Ta(10 nm)/PET with magnetic field along the (c) easy and (d) hard axes under compressive and tensile strains.
Summary for the strain dependence of Hc and Mr /Ms with H applied along the easy and hard axes in (a) FeGa(50 nm)/PET and (b) FeGa(50 nm)/Ta(10 nm)/PET films. (c) Using the modified Stoner-Wohlfarth model and the anisotropy geometry in the inset of (a), the Mr /Ms of hysteresis loops for FeGa(50 nm)/PET (red lines) and FeGa(50 nm)/Ta(10 nm)/PET (blue lines) as a function of the strain-induced uniaxial anisotropy Ke /Ms can be calculated. (d) Using this simulation definition, the experimental results can be accordingly revised to the squareness as a function of Ke /Ms .
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