Full text loading...
(a) Schematic illustration of our NIL process that is suitable for epitaxial patterning. Desirable wedge-shaped resist profile and Mo undercut profile for improved liftoff were demonstrated. SEM images of (b) wedge-shaped bilayer resist (LOR-1A/NXR-1025) on MgO substrate, and (c) epitaxial Fe nanowire arrays (wire width ∼300 nm).
XRD (a) θ−2θ scan, (b) in-plane Φ-scan, and (c) rocking curve of the epitaxial Fe nanowire arrays. (d) Relative orientations of the Fe cubic easy axes, the shape anisotropy, K u, and the external magnetic field, H.
Longitudinal (||) and transverse (⊥) MOKE signals measured at (a) ϕ = 0°, (b) ϕ = 90°, (c) ϕ = 340°, (d) ϕ = 120°. Magnetization orientation at each step is illustrated by an arrow enclosed in a box.
ϕ-dependence of the experimentally observed switching fields for (a) H 1, displaying a twofold symmetry, and (b) H 2, showing a fourfold-like symmetry, respectively. Three-step loops were observed only at ϕ = 90° and 270° therefore an additional switching field was observed.
Article metrics loading...