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Nanoimprint-lithography patterned epitaxial Fe nanowire arrays with misaligned magnetocrystalline and shape anisotropies
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10.1063/1.4794358
/content/aip/journal/jap/113/17/10.1063/1.4794358
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/17/10.1063/1.4794358
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Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic illustration of our NIL process that is suitable for epitaxial patterning. Desirable wedge-shaped resist profile and Mo undercut profile for improved liftoff were demonstrated. SEM images of (b) wedge-shaped bilayer resist (LOR-1A/NXR-1025) on MgO substrate, and (c) epitaxial Fe nanowire arrays (wire width ∼300 nm).

Image of FIG. 2.
FIG. 2.

XRD (a) −2 scan, (b) in-plane Φ-scan, and (c) rocking curve of the epitaxial Fe nanowire arrays. (d) Relative orientations of the Fe cubic easy axes, the shape anisotropy, , and the external magnetic field, .

Image of FIG. 3.
FIG. 3.

Longitudinal (||) and transverse (⊥) MOKE signals measured at (a)  = 0°, (b)  = 90°, (c)  = 340°, (d)  = 120°. Magnetization orientation at each step is illustrated by an arrow enclosed in a box.

Image of FIG. 4.
FIG. 4.

-dependence of the experimentally observed switching fields for (a) , displaying a twofold symmetry, and (b) , showing a fourfold-like symmetry, respectively. Three-step loops were observed only at  = 90° and 270° therefore an additional switching field was observed.

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/content/aip/journal/jap/113/17/10.1063/1.4794358
2013-03-05
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nanoimprint-lithography patterned epitaxial Fe nanowire arrays with misaligned magnetocrystalline and shape anisotropies
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/17/10.1063/1.4794358
10.1063/1.4794358
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