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Ultrathin magnetic oxide EuO films on Si(001) using passivation—Controlled by hard x-ray photoemission spectroscopy
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10.1063/1.4795010
/content/aip/journal/jap/113/17/10.1063/1.4795010
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/17/10.1063/1.4795010
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Figures

Image of FIG. 1.
FIG. 1.

EuO/Si(001) heterostructure with SiO passivation. Right Interface-sensitive Si 1 core-level spectra for different SiO passivations of the Si(001) surface.

Image of FIG. 2.
FIG. 2.

HAXPES analysis of the EuO/Si interface. (a) and (b) Si 1 and 2 core-levels recorded at low excitation energy ( ) to probe selectively the Si surface. (c)–(e) Eu 3, 4 core, and 4 valence-levels (in agreement with Refs. ) recorded at high excitation energy ( ) to fully probe the buried reaction layer at the bottom of the EuO thin film.

Image of FIG. 3.
FIG. 3.

Chemical properties and crystalline structure of EuO on passivated Si. Thicknesses of SiO passivation and the resulting EuSi are determined from Si 1 and 2 spectra. Inset: RHEED after 4 nm EuO growth.

Image of FIG. 4.
FIG. 4.

Magnetic properties of the 4 nm EuO/Si(001) heterostructures dependent on the thickness of the Si(001) surface passivation.

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/content/aip/journal/jap/113/17/10.1063/1.4795010
2013-03-13
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ultrathin magnetic oxide EuO films on Si(001) using SiOx passivation—Controlled by hard x-ray photoemission spectroscopy
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/17/10.1063/1.4795010
10.1063/1.4795010
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