1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Critical field of two-dimensional superconducting Sn1− x /Si x bimetallic composite cluster assembled films with energetic cluster impact deposition
Rent:
Rent this article for
USD
10.1063/1.4798262
/content/aip/journal/jap/113/17/10.1063/1.4798262
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/17/10.1063/1.4798262

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of a side of view of PGCCD.

Image of FIG. 2.
FIG. 2.

Bright-field TEM images of the Sn /Si clusters prepared with (a) = 0, (b)  = 0.35, and (c) and (d)  = 0.65 deposited in  = 0 kV. The samples of (a)∼(c) have average thickness of 1 nm and one of (d) has average thickness of 30 nm.

Image of FIG. 3.
FIG. 3.

(a) and (b) TEM images of the Sn /Si clusters prepared with  = 0.28. (c) and (d) nano-beam EDX spectra taken from the marked areas in (a) and (b). (e) High-resolution TEM image of the Sn /Si cluster with  = 0.38. The values in (e) are lattice spacing estimated by the lattice fringes.

Image of FIG. 4.
FIG. 4.

(a) XRD patterns of the Sn /Si cluster assembled films prepared at  = 0, 0.27, 0.47, and 0.54 deposited in  = −20 kV. The closed circles indicate a set of Bragg peaks for the β-Sn structure. (b) Enlarged view of (a) around (220) Bragg peak (closed triangles) of the diamond structure of Si.

Image of FIG. 5.
FIG. 5.

Electrical resistance as a function of magnetic field, , for the Sn /Si cluster assembled films prepared at  = 0, 0.23, 0.35, 0.51, and 0.57 deposited in  = −20 kV.

Image of FIG. 6.
FIG. 6.

The critical field, , versus plots for the Sn /Si cluster assembled films deposited in  = −20 kV. The closed squares are obtained in the experiments and the broken line is the theoretical value estimated by Eq. (5) .

Tables

Generic image for table
Table I.

A comparison of the mean free path of electron, , the average diameter of Sn cluster, , the penetration length, and the critical field, , for the Sn /Si cluster assembled films with  < 0.57 deposited in  = −20 kV.

Loading

Article metrics loading...

/content/aip/journal/jap/113/17/10.1063/1.4798262
2013-05-01
2014-04-17
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Critical field of two-dimensional superconducting Sn1−x/Six bimetallic composite cluster assembled films with energetic cluster impact deposition
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/17/10.1063/1.4798262
10.1063/1.4798262
SEARCH_EXPAND_ITEM