The results of tape test using 8422B. The concentrations of Mn were 2%, 4%, 6%, 8%, and 10% and the thickness of Cu and Cu-Mn was 500 and 20 nm, respectively.
Depth profiles of Cu/Cu-Mn/glass films after annealing at 320 °C for 5 min for (a) Cu (500 nm)/Cu-4 at. % Mn (20 nm)/glass and (b) Cu (500 nm)/Cu-10 at. % Mn (20 nm)/glass.
Results of angle resolved XPS analysis. The incident angle of X-ray was 90°. O 1s for (a) Cu-4 at. Mn/glass and (b) Cu-10 at. % Mn/glass, Si 2p for (c) Cu-4 at. Mn/glass and (d) Cu-10at. % Mn/glass Si, Mn 3p for (e) Cu-4 at. Mn/glass and (f) Cu-10 at. % Mn/glass Mn 3p. Annealing condition was 320 °C 5 min. The results of deconvolution of the XPS spectra were also shown.
Depth profiles of the interface region by EELS spectra.
TEM-EELS spectra for (a) Si L-edge, (b) O K-edge, (c) Mn L 2, and L 3-edge. The adjacent points are separated by 1 nm in depth.
The intensity ratio (I3/I2) of Mn L 3-edge and Mn L 2-edge as a function of the depth points. The value of (I3/I2) for Mn corresponds to 1.0, for MnO (Mn2+) to 1.9, for Mn3O4 (Mn2+ and Mn3+) to 2.0, for Mn2O3 (Mn3+) to 1.5, and for MnO2 (Mn4+) to 1.6, respectively.
Results of angle resolved XPS analysis for Si 2p. The incident angles of X-ray were 20°, 30°, 45°, 60°, and 90°.
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