(a) The TEM image of a few droplets of GO on a TEM grid. (b) High resolution TEM image of GO on a TEM grid. Inset shows the SAED pattern image. (c) A spin-coated GO thin film on a fused silica substrate. (d) An rGO thin film on fused silica, obtained by thermal reduction. (e) A schematic illustration (bottom) and the AFM image (top) of our rGO thin film on a fused silica substrate.
(a) The AFM image of a spin-coated rGO thin film on a fused silicasubstrate annealed at 850 °C for 30 min. (b) The corresponding layer-dependent color AFM image (black: empty = 19%, blue: monolayer = 64.7%, white: bilayer = 15.5%, red: trilayer = 0.6%, and violet: >thicker layers = 0.2%).
(a) The optical transmission spectra of GO (blue), rGO (red), and graphene grown by CVD (black). The rGO sample was annealed at 850 °C for 30 min. (b) The optical absorbance spectra of GO, rGO (annealed for 30 min at 550, 650, and 850 °C), and graphene. The arrows indicate the absorption peak energies for rGO and graphene.
(a) The Raman spectra of GO (blue), rGO (red), and graphene grown by CVD (black). Their G bands are scaled to 1:1:0.7, respectively. (b) The effect of annealing temperature on the Raman spectra of rGO, compared with GO and graphene. The annealing duration is fixed to 30 min. The curves are systematically shifted for visibility. The graphene data are scaled to the G band of GO. (c) The effect of annealing duration on the Raman spectra of rGO, compared with GO and graphene. The annealing temperatures are 550 and 850 °C. The curves are shifted and scaled as in (b).
The transmission spectra (main) and optical sheet resistance (inset) of GO (blue), rGO (red), and graphene grown by CVD (black).
Article metrics loading...
Full text loading...