AFM topography images (3 × 3 μm2) of La0.7Sr0.3MnO3 films grown on (111)-oriented SrTiO3. The thicknesses and deposition temperatures are indicated in the figure. Note the use of different scale bars. The insert in panel (b) shows an AFM image of the substrate with the same lateral and height scales.
Arrhenius plot of the critical thickness, dc, for the surface deformation (crosses) as determined from the AFM data presented in Fig. 1 and fit to the data (solid line).
AFM topography images (1 × 1 μm2) of La0.7Sr0.3MnO3 films grown at 500 °C with thicknesses of 0.5, 1, 2, and 4 nm (a)–(d), respectively. 25 The height scale bars for the AFM images are identical. The data indicate surface roughening during the initial synthesis.
(a) The surface roughness of La0.7Sr0.3MnO3 films grown at 500 °C normalized to the substrate roughness, versus film thickness. The normalization was done to eliminate roughness differences in the batch of substrates. For areas of 1 × 1 μm the substrates has a mean roughness of 0.41 nm with a standard deviation of 0.11 nm. (b) The schematic indicates the different growth modes as a function of film thickness.
(a) Cross-section HRTEM image of the (111) La0.7Sr0.3MnO3/SrTiO3 interface. (b) Out-of-plane strain for (111)-oriented (solid blue line) and (001)-oriented (dashed red line) La0.7Sr0.3MnO3 deposited on SrTiO3. The degree of strain is deduced from GPA analysis. For the (111)-oriented film, data acquired with an image-corrected TEM was used, and for the (001)-oriented film data from a probe-corrected TEM was used. In both cases, the substrate was used as reference. (c) STEM image of the (001) La0.7Sr0.3MnO3/SrTiO3 interface.
(a) Linear qz x-ray diffraction profile around the (111)pc reflection. (b) Reciprocal space map around the (033)pc reflection of the film and substrate. (c) φ-scan for the (022)pc reflection. (d) Electron diffraction pattern taken along the pc zone axis. (e) Electron diffraction pattern taken along the pc zone axis.
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