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Electrical characterisation and predictive simulation of defects induced by keV Si+ implantation in n-type Si
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10.1063/1.4804332
/content/aip/journal/jap/113/18/10.1063/1.4804332
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/18/10.1063/1.4804332
/content/aip/journal/jap/113/18/10.1063/1.4804332
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/content/aip/journal/jap/113/18/10.1063/1.4804332
2013-05-13
2015-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrical characterisation and predictive simulation of defects induced by keV Si+ implantation in n-type Si
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/18/10.1063/1.4804332
10.1063/1.4804332
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