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Controlled synthesis of buried delta-layers of Ag nanocrystals for near-field plasmonic effects on free surfaces
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10.1063/1.4804171
/content/aip/journal/jap/113/19/10.1063/1.4804171
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/19/10.1063/1.4804171

Figures

Image of FIG. 1.
FIG. 1.

Cross-sectional TEM image of the whole SiO layer implanted with 3 keV and 4.7 × 10 at./cm. In inset, high resolution image of a Ag nanoparticle.

Image of FIG. 2.
FIG. 2.

Comparison of the nanoparticles position (average distance of the nanoparticle center with respect to the surface) measured by TEM (star symbols) with the projected range predicted by (circles) with increasing energy and “low” doses (concentrations ≤20 at. % at the peak maximum). On the top, cross-sectional TEM images of the samples implanted with increasing energy (from 0.6 to 20 keV) and doses leading to concentrations ≤20 at. % at the peak maximum.

Image of FIG. 3.
FIG. 3.

Cross-sectional TEM images of the layers implanted with a fixed energy (10 keV) and increasing doses: (a)–(d) zoom of the layers implanted with 7.12 × 10 cm, 9.5 × 10 cm, 1.9 × 10 cm, and 3.8 ×  10 cm, respectively. (e)–(h) are the associated plan-view images.

Image of FIG. 4.
FIG. 4.

(a) simulations of the profiles for the different doses (7.12 × 10, 9.5 × 10, 1.9 × 10, 3.8 × 10 cm) at 10 keV. (b) Dependence of the projected range on implanted dose predicted by (black circles) and measured by TEM (green up triangles) for a fixed implantation energy (10 keV).

Image of FIG. 5.
FIG. 5.

Experimental measurement of the surface recession: cross-sectional TEM image of the sample implanted at 20 keV for 4.65 × 10 cm (a) with the surface hidden by a Cr mask deposed before implantation, and (b) without mask. (c) Dependence of the surface recession on implanted dose predicted by (dashed line) and measured by TEM (blue squares), and by optical reflectance (red circles) for a fixed implantation energy (20 keV).

Image of FIG. 6.
FIG. 6.

Experimental (continuous lines) and theoretical (dotted lines) reflectance curves of samples implanted at 20 keV with three different doses. The curves to high doses have been arbitrary shifted for clarity.

Image of FIG. 7.
FIG. 7.

Experimental Ag depth-distribution (dots) deduced from RBS measurements compared to the corresponding theoretical implanted profile (continuous line) predicted by simulations (divided by 5) for the sample implanted at 10 keV with 1.9 × 10 ions/cm. The associated XTEM image is at the back of the figure.

Image of FIG. 8.
FIG. 8.

Implanted dose (number of Ag atoms/cm) in the nanoparticles measured by TEM (red stars) compared to the dose predicted by (blue circles) and to the quantity of Ag present in the whole layer as measured by RBS (green up triangle). The dotted line indicates the nominal dose.

Tables

Generic image for table
Table I.

List of the implanted samples. The dose values (referred as “nominal” in the text) have been determined by a calibration of the implantation setup.

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/content/aip/journal/jap/113/19/10.1063/1.4804171
2013-05-16
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Controlled synthesis of buried delta-layers of Ag nanocrystals for near-field plasmonic effects on free surfaces
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/19/10.1063/1.4804171
10.1063/1.4804171
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