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Electron molecular beam epitaxy: Layer-by-layer growth of complex oxides via pulsed electron-beam deposition
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10.1063/1.4774238
/content/aip/journal/jap/113/2/10.1063/1.4774238
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/2/10.1063/1.4774238

Figures

Image of FIG. 1.
FIG. 1.

Photographs of the PED system. (a) A view inside the chamber showing both electron guns, the substrate holder and heater, and the target stage. (b) An image of the plume produced during ablation of the CoFe2O4 target.

Image of FIG. 2.
FIG. 2.

Atomic force microscopy topography scans of CoFe2O4 films grown at (a) 9 kV and (b) 12 kV, showing similar island growth modes but different particulate densities. Note the difference in scale between the images.

Image of FIG. 3.
FIG. 3.

Atomic force microscopy topography scans of BiFeO3 films grown on (a) SrTiO3 and (b) LaAlO3. (c) X-ray diffraction measurement of both films showing Kiessig fringes.

Image of FIG. 4.
FIG. 4.

Atomic force microscopy topography images (a) and (c) and line scans (b) and (d) of La0.72Sr0.28MnO3 films grown on LaAlO3 with thicknesses (a)and (b) 2.1 nm and (c) and (d) 4.4 nm showing the Stranski-Krastanov growth mode. Cross-sectional line scans are taken along the gray lines shown in the images.

Image of FIG. 5.
FIG. 5.

(a) X-ray diffraction measurement of BiFeO3-La0.72Sr0.28MnO3 bilayer grown on SrTiO3; (b) PFM topography scan of sample; (c) PFM out-of-plane phase scan of sample showing switched regions.

Tables

Generic image for table
Table I.

Pulsed electron beam source parameters. 19

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/content/aip/journal/jap/113/2/10.1063/1.4774238
2013-01-09
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electron molecular beam epitaxy: Layer-by-layer growth of complex oxides via pulsed electron-beam deposition
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/2/10.1063/1.4774238
10.1063/1.4774238
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