1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Kelvin force microscopy characterization of charging effect in thin a-SiOxNy:H layers deposited in pulsed plasma enhanced chemical vapor deposition process by tuning the Silicon-environment
Rent:
Rent this article for
USD
10.1063/1.4805026
/content/aip/journal/jap/113/20/10.1063/1.4805026
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/20/10.1063/1.4805026
/content/aip/journal/jap/113/20/10.1063/1.4805026
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/jap/113/20/10.1063/1.4805026
2013-05-22
2014-10-23
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Kelvin force microscopy characterization of charging effect in thin a-SiOxNy:H layers deposited in pulsed plasma enhanced chemical vapor deposition process by tuning the Silicon-environment
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/20/10.1063/1.4805026
10.1063/1.4805026
SEARCH_EXPAND_ITEM