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Reduced leakage in epitaxial BiFeO3 films following oxygen radio frequency plasma treatment
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10.1063/1.4808461
/content/aip/journal/jap/113/21/10.1063/1.4808461
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/21/10.1063/1.4808461

Figures

Image of FIG. 1.
FIG. 1.

XRD showing epitaxial nature of BiFeO/STO (001) and BiFeO on SrRuO/STO.

Image of FIG. 2.
FIG. 2.

Leakage current values of films before and after oxygen plasma treatment (a) LAO_20, (b) LAO_10, (c) STO_5, (d) STO_2.

Image of FIG. 3.
FIG. 3.

P-E hysteresis loop measurements of STO_5 and LAO_20 before and after oxygen plasma treatment.

Image of FIG. 4.
FIG. 4.

XRD of LAO_10 (10 min) film before and after oxygen plasma treatment.

Image of FIG. 5.
FIG. 5.

X-ray reflectivity of STO_5 film (a) before and (b) after oxygen plasma treatment; mark A showing fitting of critical angle.

Tables

Generic image for table
Table I.

Optimized parameter used for deposition of electrode SRO on STO (001) and BFO on SRO/STO.

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/content/aip/journal/jap/113/21/10.1063/1.4808461
2013-06-06
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reduced leakage in epitaxial BiFeO3 films following oxygen radio frequency plasma treatment
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/21/10.1063/1.4808461
10.1063/1.4808461
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