Schematic diagram of the RPECVD system used to fabricate the samples.
FTIR transmission spectrum of samples T3, T4, and T5.
HRTEM micrograph for (a) sample T1 and (b) sample T5. Both samples have the same Si-nanocluster average size of 3.1 nm.
Average size, density, and size distribution of particles for samples T1 and T5. More than 81% of the particles found have sizes between 2 and 4 nm.
PL spectra of samples T1, T2, and T3. The PL spectra of sample T3 is shifted towards ∼523 nm and has a shoulder at ∼403 nm.
PL spectra of samples T4 and T5, along with that of the PL spectrum of sample T1 multiplied by a factor of 90. The peaks appearing at wavelengths above 700 nm in the augmented PL spectra are due to spurious light during measurements.
PL spectra from films with different thickness, showing clearly the distortions generated in the PL spectra with respect to that of the thinnest sample, as the thickness increases above 200 nm.
Optical transmittance spectra for samples T1, T3, T4, T5 with different thickness deposited on quartz substrates.
Schematic of the composite film being excited at an oblique angle of incidence and emitting luminescent light back into the incidence medium. The multiple reflection process of a plane wave radiated upwards by a QD is also shown.
Normalized simulated and experimental PL spectra for sample T3. The thickness d used to simulate this PL spectrum was 240 nm.
Normalized simulated and experimental PL spectra for sample T4. The thickness d used in the simulated PL spectrum was 1775 nm.
Normalized simulated and experimental spectra for sample T5. In this case, the thickness d used for the simulation of the PL spectrum was 4340 nm.
Main characteristics of the samples.
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