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Multi-technique x-ray and optical characterization of crystalline phase, texture, and electronic structure of atomic layer deposited Hf1−xZrxO2 gate dielectrics deposited by a cyclical deposition and annealing scheme
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10.1063/1.4811446
/content/aip/journal/jap/113/23/10.1063/1.4811446
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/23/10.1063/1.4811446
/content/aip/journal/jap/113/23/10.1063/1.4811446
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/content/aip/journal/jap/113/23/10.1063/1.4811446
2013-06-18
2015-01-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Multi-technique x-ray and optical characterization of crystalline phase, texture, and electronic structure of atomic layer deposited Hf1−xZrxO2 gate dielectrics deposited by a cyclical deposition and annealing scheme
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/23/10.1063/1.4811446
10.1063/1.4811446
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