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Fluid management in roll-to-roll nanoimprint lithography
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10.1063/1.4811524
/content/aip/journal/jap/113/23/10.1063/1.4811524
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/23/10.1063/1.4811524

Figures

Image of FIG. 1.
FIG. 1.

Schematic of a roll-to-roll nanoimprint lithography setup showing a roller of radius with patterned template, a rigid substrate, and a UV source. UV curable imprint material is ink-jetted as droplets on the substrate which forms a patterned resist layer after UV-curing.

Image of FIG. 2.
FIG. 2.

Our model for the R2RNIL shows the roller with radius and the substrate, both moving with a speed . (a) The inset shows the imprint droplets of radius with distance between them. (b) A further simplified view of the process. The figure shows the droplets move in the positive direction along with the roller and the substrate. The droplets merge at  =  to form a continuous resist layer of thickness . The patterned imprint layer peels off from the roller at  = . The minimum gap between the roller and substrate is at  = 0.

Image of FIG. 3.
FIG. 3.

(a) Schematic diagram showing merging of droplets to the continuous film of imprint material. (i) A continuous film of imprint material and the droplets I, II, and III. (ii) Droplet I coming in contact with the roller as it moves forward. (iii) Droplet I about to merge with the film. (iv) Droplet I completely merges into the film and droplet II merges next. (b) An enlarged view of (a) (iii) showing the position of droplets at the point of merging . The shape of droplet at  =  can be approximated to be cylindrical. The droplet at  =  is a part of the continuous film and completely conformed to the shape of the roller.

Image of FIG. 4.
FIG. 4.

The figure shows the final resist peeling off from the roller as the tensile energy in the resist balances the surface energy due to adhesion in the contact region. (a)  >  and (b)  < . For  < , there is no compression zone in the resist layer and the total strain is only due to the tensile zone.

Image of FIG. 5.
FIG. 5.

The imprint material behaves as a viscoelastic fluid as it is cured by the UV source. After complete curing, the imprint material can be modeled as an elastic solid. The figure also shows the boundary conditions governing the flow.

Image of FIG. 6.
FIG. 6.

The plot showing the point of merging of the droplets as a function of / for different values of and at  = 1 m/min. The inset shows the plot between non-dimensionalized and non-dimensionalized . (▼),  = 1 m; (▪),  = 100 nm; (●),  = 10 nm; (),  = 2 cm; (---),  = 1 cm.

Image of FIG. 7.
FIG. 7.

The plot showing the point of peel-off of the resist from the roller as a function of / for different values of and at  = 1 m/min. Theinset shows the plot between non-dimensionalized and non-dimensionalized . (▼),  = 1 m; (▪),  = 100 nm; (●),  = 10 nm; (),  = 2 cm; (---),  = 1 cm.

Image of FIG. 8.
FIG. 8.

The plot showing the exposure time of the resist layer as a function of/ for different values of and at  = 1 m/min. The inset shows the plot between non-dimensionalized and non-dimensionalized . (♦),  = 10 m; (▼),  = 1 m; (▪),  = 100 nm; (),  = 2 cm; (---),  = 1 cm.

Image of FIG. 9.
FIG. 9.

The pressure profile in the viscoelastic regime of the resist layer as a function of distance for  = 100 nm,  = 1 cm,  = 1 m/min, and different values of h.

Image of FIG. 10.
FIG. 10.

The pressure in the elastic region of the resist layer from  = 0 to  =  for  = 1 m/min,  = 1 m. A positive pressure implies a compressive force, while a negative pressure implies tensile strain in the resist layer. (▼), / = 0.9; (●), / = 1.8; (),  = 2 cm; (---),  = 1 cm.

Image of FIG. 11.
FIG. 11.

The force per unit width on the substrate as function of at  = 1 m/min for different values of and /. (), / = 1.1; (---), / = 0.98.

Image of FIG. 12.
FIG. 12.

The shear force per unit width () on the substrate as function of at  = 1 m/min for  = 1 cm and different values of /.

Image of FIG. 13.
FIG. 13.

The torque per unit width () on the roller as function of h at u = 1 m/min for  = 1 cm and different values of /.

Tables

Generic image for table
Table I.

Estimated minimum UV intensity, (W/cm) required for curing.

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/content/aip/journal/jap/113/23/10.1063/1.4811524
2013-06-21
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fluid management in roll-to-roll nanoimprint lithography
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/23/10.1063/1.4811524
10.1063/1.4811524
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