The schematic configuration of SPPRIL, and composed of prism, polymer, resist, metal, and substrate.
Reflectivity varying with incident angle and resist thickness in SPPRIL, dp = 0.1μm and d m = 0.1μm are constant.
Intensity distribution in SPPRIL at one TM or TE plane wave irradiating with dp = 0.1 μm, dr = 0.085 μm, dm = 0.1 μm and θ = 51.9°.
Two SPP interference result on the metal film, (a) light field distribution in the resist and the metal film, (b) the intensity distributions of cross section at y = 0.
Vertical intensity distribution of one interference fringe varying with different metal film thicknesses, (a) the maximum intensity (Imax ) and (b) minimum intensity (Imin ).
Evolution of SPP interference patterns on the metal film with different incident beams, (a) four beams, and (b) six beams.
Variation of the intensity at polymer/resist (n 1/n 2) and resist/metal (n 2/n 3) with different (a) polymer thickness dp (dm = 0.1μm, dr = 0.085μm, and θ = 51.9°), (b) resist thickness dr (dp = 0.1μm, dm = 0.1μm, and θ = 51.9°) and (c) incident angle θ (dp = 0.1μm, dr = 0.085 μm, and dm = 0.1μm).
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