1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image
Rent:
Rent this article for
USD
10.1063/1.4811530
/content/aip/journal/jap/113/23/10.1063/1.4811530
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/23/10.1063/1.4811530
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

The schematic configuration of SPPRIL, and composed of prism, polymer, resist, metal, and substrate.

Image of FIG. 2.
FIG. 2.

Reflectivity varying with incident angle and resist thickness in SPPRIL,  = 0.1m and d = 0.1m are constant.

Image of FIG. 3.
FIG. 3.

Intensity distribution in SPPRIL at one TM or TE plane wave irradiating with  = 0.1 m,  = 0.085 m,  = 0.1 m and  = 51.9°.

Image of FIG. 4.
FIG. 4.

Two SPP interference result on the metal film, (a) light field distribution in the resist and the metal film, (b) the intensity distributions of cross section at y = 0.

Image of FIG. 5.
FIG. 5.

Vertical intensity distribution of one interference fringe varying with different metal film thicknesses, (a) the maximum intensity () and (b) minimum intensity ().

Image of FIG. 6.
FIG. 6.

Evolution of SPP interference patterns on the metal film with different incident beams, (a) four beams, and (b) six beams.

Image of FIG. 7.
FIG. 7.

Variation of the intensity at polymer/resist ( / ) and resist/metal ( / ) with different (a) polymer thickness ( = 0.1m,  = 0.085m, and  = 51.9°), (b) resist thickness ( = 0.1m,  = 0.1m, and  = 51.9°) and (c) incident angle ( = 0.1m,  = 0.085 m, and  = 0.1m).

Loading

Article metrics loading...

/content/aip/journal/jap/113/23/10.1063/1.4811530
2013-06-18
2014-04-21
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/23/10.1063/1.4811530
10.1063/1.4811530
SEARCH_EXPAND_ITEM