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In situ atomic layer deposition study of HfO2 growth on NH4OH and atomic hydrogen treated Al0.25Ga0.75N
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10.1063/1.4812243
/content/aip/journal/jap/113/24/10.1063/1.4812243
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/24/10.1063/1.4812243
/content/aip/journal/jap/113/24/10.1063/1.4812243
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/content/aip/journal/jap/113/24/10.1063/1.4812243
2013-06-26
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ atomic layer deposition study of HfO2 growth on NH4OH and atomic hydrogen treated Al0.25Ga0.75N
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/24/10.1063/1.4812243
10.1063/1.4812243
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