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Volume 113, Issue 4 Front cover image - large version

Volume 113, Issue 4, 28 January 2013

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Index of content:

FEATURED ARTICLE
  • Plasma processing of low-k dielectrics
  • APPLIED PHYSICS REVIEWS—FOCUSED REVIEW
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38d913362403a4a254fa758cb6527ba5 journal.issuezxybnytfddd
Scitation: Journal of Applied Physics - Volume 113, Issue 4
http://aip.metastore.ingenta.com/content/aip/journal/jap/113/4
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