(a) Simulated cylindrical array. (b) Electron trajectory in a single well.
Simulation control graph of effective SEY of micro-porous array.
Simulated and measured SEY curves of original Ag sample before and after in situ plasma cleaning.
Simulated SEY curves of a single cylindrical well with varying aspect ratio .
Simulated SEY dependence of the micro-porous array surface on porosity.
Flow chart of photolithography process used for micro-porous array realization.
LSM results for micro-porous array structure on silver plated samples.
SEM image of inner surface of cylindrical well of Ag-1 realized by photolithography.
SEM image of micro-porous array surface of Cu-1.
Measured and simulated SEY characteristics of micro-porous Ag plating samples.
SEY characteristics of directly etched Ag samples. The inset is the SEM image of the sample etched 40 s.
SEY test results for micro-porous copper samples.
Dependence of maximum SEY on porosity and aspect ratio.
2D rectangular structure used for derivation.
Measured and calculated SEY of Ag samples with varying and .
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