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Suppression of secondary electron yield by micro-porous array structure
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Image of FIG. 1.
FIG. 1.

(a) Simulated cylindrical array. (b) Electron trajectory in a single well.

Image of FIG. 2.
FIG. 2.

Simulation control graph of effective SEY of micro-porous array.

Image of FIG. 3.
FIG. 3.

Simulated and measured SEY curves of original Ag sample before and after in situ plasma cleaning.

Image of FIG. 4.
FIG. 4.

Simulated SEY curves of a single cylindrical well with varying aspect ratio .

Image of FIG. 5.
FIG. 5.

Simulated SEY dependence of the micro-porous array surface on porosity.

Image of FIG. 6.
FIG. 6.

Flow chart of photolithography process used for micro-porous array realization.

Image of FIG. 7.
FIG. 7.

LSM results for micro-porous array structure on silver plated samples.

Image of FIG. 8.
FIG. 8.

SEM image of inner surface of cylindrical well of Ag-1 realized by photolithography.

Image of FIG. 9.
FIG. 9.

SEM image of micro-porous array surface of Cu-1.

Image of FIG. 10.
FIG. 10.

Measured and simulated SEY characteristics of micro-porous Ag plating samples.

Image of FIG. 11.
FIG. 11.

SEY characteristics of directly etched Ag samples. The inset is the SEM image of the sample etched 40 s.

Image of FIG. 12.
FIG. 12.

SEY test results for micro-porous copper samples.

Image of FIG. 13.
FIG. 13.

Dependence of maximum SEY on porosity and aspect ratio.

Image of FIG. 14.
FIG. 14.

2D rectangular structure used for derivation.


Generic image for table
Table I.

Measured and calculated SEY of Ag samples with varying and .


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Suppression of secondary electron yield by micro-porous array structure