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Growth and electrical properties of spin coated ultrathin ZrO2 films on silicon
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10.1063/1.4812733
/content/aip/journal/jap/114/1/10.1063/1.4812733
http://aip.metastore.ingenta.com/content/aip/journal/jap/114/1/10.1063/1.4812733
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

XRD patterns of ZrO ultrathin films.

Image of FIG. 2.
FIG. 2.

SEM images of surface morphologies and cross-sections of ZrO films annealed at (a) 30 min, (b) 60 min, (c) 90 min, and (d) 120 min.

Image of FIG. 3.
FIG. 3.

Effect of annealing time on film thickness.

Image of FIG. 4.
FIG. 4.

C-V characteristics of ZrO films.

Image of FIG. 5.
FIG. 5.

Cap. vs. Freq. behaviour of ZrO films.

Image of FIG. 6.
FIG. 6.

Leakage current density measurement.

Image of FIG. 7.
FIG. 7.

Dielectric breakdown measurement.

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/content/aip/journal/jap/114/1/10.1063/1.4812733
2013-07-01
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth and electrical properties of spin coated ultrathin ZrO2 films on silicon
http://aip.metastore.ingenta.com/content/aip/journal/jap/114/1/10.1063/1.4812733
10.1063/1.4812733
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