SEM images of nanostructured flat Si sample after different Ni deposition time and etching. Ni deposition time: (a) −10 s and (b) −60 s.
Reflectance as a function of wavelength of polished mono-crystalline Si wafers etched after various Ni deposition time.
SEM images of p-Si wafer n+ surface: (a) micro-textured in KOH/IPA, (b) enlarged separate pyramid, (c) two-scale structured surface of separate pyramid, (d) nanostructure on pyramid surface (150 000 × magnification).
Reflectance of different structures of Si wafers as a function of wavelength.
Values of weighted reflection for different samples.
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