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Lateral Ge segregation and strain evolution in SiGe alloys during the formation of nickel germano-silicide on a relaxed Si0.73Ge0.27 epilayer
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10.1063/1.4813778
/content/aip/journal/jap/114/2/10.1063/1.4813778
http://aip.metastore.ingenta.com/content/aip/journal/jap/114/2/10.1063/1.4813778
/content/aip/journal/jap/114/2/10.1063/1.4813778
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/content/aip/journal/jap/114/2/10.1063/1.4813778
2013-07-12
2014-12-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Lateral Ge segregation and strain evolution in SiGe alloys during the formation of nickel germano-silicide on a relaxed Si0.73Ge0.27 epilayer
http://aip.metastore.ingenta.com/content/aip/journal/jap/114/2/10.1063/1.4813778
10.1063/1.4813778
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