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Lateral Ge segregation and strain evolution in SiGe alloys during the formation of nickel germano-silicide on a relaxed Si0.73Ge0.27 epilayer
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10.1063/1.4813778
/content/aip/journal/jap/114/2/10.1063/1.4813778
http://aip.metastore.ingenta.com/content/aip/journal/jap/114/2/10.1063/1.4813778
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

XRD patterns of nickel germano-silicide films formed with a SiGe epilayer in a temperature range of 300–900 °C.

Image of FIG. 2.
FIG. 2.

The sheet resistance of Ni germano-silicide film as a function of annealing temperature. The inset is the SEM images of surface morphology of Ni germano- silicide formed at 600 and 800 °C.

Image of FIG. 3.
FIG. 3.

Raman spectra measured at room temperature for the as-deposited and annealed Ni/SiGe samples at temperature ranging from 300 °C to 800 °C.

Image of FIG. 4.
FIG. 4.

Ge content and strain status of the SiGe alloys as a function of annealing temperature.

Image of FIG. 5.
FIG. 5.

Cross sectional TEM images and EDS line profiles for the samples annealed at 400 °C (a), and 800 °C (b) and (c), where (b) is the line profiles for the nickel germano-silicide grains, and (c) is the line profiles for the Ge-rich SiGe regions at the grain boundaries.

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/content/aip/journal/jap/114/2/10.1063/1.4813778
2013-07-12
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Lateral Ge segregation and strain evolution in SiGe alloys during the formation of nickel germano-silicide on a relaxed Si0.73Ge0.27 epilayer
http://aip.metastore.ingenta.com/content/aip/journal/jap/114/2/10.1063/1.4813778
10.1063/1.4813778
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