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The HR-XRD spectrum around the (004) reflections of the MAO substrate and the NCO film.
Bright field images from NCO250, NCO350, and NCO550 films with (a)–(c) and (d)–(e) diffracting vectors, respectively. Note the different appearance of the contrast pattern, in particular, for the NCO550 film. All the films are single crystalline.
Polarized Raman spectra of NCO/MAO films grown at , 350, 450, 500, 525, and 550 °C, obtained at room temperature with 488 nm excitation.
Variations of the mode frequencies of NCO/MAO films with substrate temperature during deposition.
Temperature-dependent Raman spectra of the NCO250 between 23 and 600 °C. The spectra, taken at 23 °C after the annealing, are practically identical to those measured at the same temperature before the annealing. The peak marked with a star comes from the MAO substrate
Polarized Raman spectra of NCO250 (left column) and NCO550 (right column) before annealing (first row), after annealing at 600 °C for 2 h in oxygen (second row), and after annealing at 600 °C for 2 h in vacuum (third row).
XX and XY spectra of NCO550 (upper panel) and NCO250 (bottom panel) obtained with 515 nm excitation at 294 K and 80 K.
Structural and magnetic properties of NCO/MAO films used in this study.
Polarization selection rules for backward Raman scattering from (001) surface of spinel structure.
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