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(a) Schematic of the samples. (b) Optical view of the partially dewetted sample showing “windows” features used for the AFM characterization.
Topography images by AFM in Tapping mode after dewetting of: (a) SOI sample (the z-scale is 155 nm), (b) sSOI 0.8% sample (the z-scale is 120 nm), (c) sSOI 1.2% sample (the z-scale is 100 nm), and (d) sSOI 1.6% sample (the z-scale is 85 nm).
Normalized heights (a) and non-dimensional areas (b) distributions of the silicon agglomerates after dewetting of free and strained silicon films. For both cases, an inset shows, respectively, the mean normalized height and the mean non-dimensional area versus the bi-axial strain. Measurements presented on both histograms were done from 100 μm−2 images.
Roundness factor distribution R of the silicon agglomerates after dewetting of free and strained silicon films. The inset shows the resulted aspect ratio L/I (where L is the longest in-plane dimension and I is the shortest in-plane dimension) of the silicon agglomerates versus the bi-axial strain.
Overview of silicon agglomerates density, non-dimensional height, non-dimensional area, and roundness as function of the bi-axial deformation of the strained silicon film.
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