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Overcoming challenges to the formation of high-quality polycrystalline TiO2:Ta transparent conducting films by magnetron sputtering
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10.1063/1.4819088
/content/aip/journal/jap/114/8/10.1063/1.4819088
http://aip.metastore.ingenta.com/content/aip/journal/jap/114/8/10.1063/1.4819088
/content/aip/journal/jap/114/8/10.1063/1.4819088
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/content/aip/journal/jap/114/8/10.1063/1.4819088
2013-08-26
2014-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Overcoming challenges to the formation of high-quality polycrystalline TiO2:Ta transparent conducting films by magnetron sputtering
http://aip.metastore.ingenta.com/content/aip/journal/jap/114/8/10.1063/1.4819088
10.1063/1.4819088
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