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Response to “Comment on ‘Evaluation of the spatial distribution of series and shunt resistance of a solarcell using dark lock-in thermography’” [J. Appl. Phys. 116, 046101 (2014)]
1. T.-y. Chung, C.-H. Wang, K.-J. Chang, S.-Y. Chen, H.-H. Hsieh, C.-P. Huang, and C.-H. Arthur Cheng, J. Appl. Phys. 115, 034901 (2014).
2. O. Breitenstein, W. Warta, and M. Langenkamp, Lock-in Thermography: Basics and Use for Evaluating Electronic Devices and Materials, 2nd ed. ( Springer, New York, 2010).
3. O. Breitenstein and S. Rißland, “ Comment on ‘Evaluation of the spatial distribution of series and shunt resistance of a solar cell using dark lock-in thermography,’” J. Appl. Phys. 116, 046101 (2014).
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