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Redistribution of Acceptor and Donor Impurities during Thermal Oxidation of Silicon
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10.1063/1.1713825
/content/aip/journal/jap/35/9/10.1063/1.1713825
http://aip.metastore.ingenta.com/content/aip/journal/jap/35/9/10.1063/1.1713825
/content/aip/journal/jap/35/9/10.1063/1.1713825
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/content/aip/journal/jap/35/9/10.1063/1.1713825
2004-07-20
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Redistribution of Acceptor and Donor Impurities during Thermal Oxidation of Silicon
http://aip.metastore.ingenta.com/content/aip/journal/jap/35/9/10.1063/1.1713825
10.1063/1.1713825
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