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The origin of internal stress in low−voltage sputtered tungsten films
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10.1063/1.322250
/content/aip/journal/jap/46/1/10.1063/1.322250
http://aip.metastore.ingenta.com/content/aip/journal/jap/46/1/10.1063/1.322250
/content/aip/journal/jap/46/1/10.1063/1.322250
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/content/aip/journal/jap/46/1/10.1063/1.322250
2008-09-02
2014-07-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: The origin of internal stress in low−voltage sputtered tungsten films
http://aip.metastore.ingenta.com/content/aip/journal/jap/46/1/10.1063/1.322250
10.1063/1.322250
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