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Ion‐ and electron‐assisted gas‐surface chemistry—An important effect in plasma etching
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10.1063/1.326355
/content/aip/journal/jap/50/5/10.1063/1.326355
http://aip.metastore.ingenta.com/content/aip/journal/jap/50/5/10.1063/1.326355
/content/aip/journal/jap/50/5/10.1063/1.326355
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/content/aip/journal/jap/50/5/10.1063/1.326355
2008-07-24
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ion‐ and electron‐assisted gas‐surface chemistry—An important effect in plasma etching
http://aip.metastore.ingenta.com/content/aip/journal/jap/50/5/10.1063/1.326355
10.1063/1.326355
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