Flow effects in epitaxial autodoping
1.G. R. Srinivasan, Proceedings Seventh International Conference on Chemical Vapor Deposition, 1979, edited by T. O. Sedgwick and H. Lydtin, (The Electrochemical Socity, Princeton, 1979), pp. 77–101.
1.Also in: J. Electrochem. Soc. 127, 1334 (1980).
2.G. R. Srinivasan, Second joint spl. VLSI issue of IEEE Trans. Electron Devices and IEEE J. Solid State Circuits, August 1980 (to be published).
3.H. A. Wilson, Proc. Camb. Phil. Soc. 12, 406 (1904), treats a similar problem in heat convection by using an alternative approach in which solutions of instantaneous heat sources, which flow past a fixed medium, are integrated with respect to time.
4.J. Irving and N. Mullineux, Mathematics in Physics and Engineering (Academic, New York, 1959), p. 143.
5.The experimental range of αr considered in this paper is Although the asymptotic expansion (Eq. 19) is pretty accurate for actual computations show that the ratio between and the first term of Eq. (19) is very nearly constant for the range Thus, Eq. (20) is a good approximation of Eq. (18) for used in this study. A certain amount of error is, however, introduced when this approximation is used for such as for low velocity flows, and this fact is also indicated by the experimental data.
6.R. Takahashi, Y. Koga, and K. Sugawara, J. Electrochem. Soc. 119, 1406 (1972).
7.H. E. Carlton and J. H. Oxley, Proceedings of the Conference on Chemical Vapor Deposition, edited by A. C. Schaffhauser (Am. Nuclear Society, Hinsdale, Illinois, 1967), p. 19.
8.See, for example, J. Crank, The Mathematics of Diffusion (Clarendon, Oxford, 1975) p. 326.
9.E. R. Gilliland, Ind. Eng. Chem. 26, 681 (1934).
10.G. R. Srinivasan, J. Electrochem. Soc. 125, 146 (1978).
11.H. B. Pogge, D. W. Boss, and E. Ebert, Proceedings of the Second International Conference on Chemical Vapor Deposition, 1970, edited by J. B. Blocher, H. E. Hintermann, and L. H. Hall, (The Electrochem. Soc., Princeton, 1970), pp. 768–793.
12.M. Ogirima (unpublished).
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