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Chemical sputtering yields of silicon resulting from F+, CF n + (n = 1,2,3) ion bombardment
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10.1063/1.331021
/content/aip/journal/jap/53/4/10.1063/1.331021
http://aip.metastore.ingenta.com/content/aip/journal/jap/53/4/10.1063/1.331021
/content/aip/journal/jap/53/4/10.1063/1.331021
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/content/aip/journal/jap/53/4/10.1063/1.331021
1982-04-01
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Chemical sputtering yields of silicon resulting from F+, CFn+ (n = 1,2,3) ion bombardment
http://aip.metastore.ingenta.com/content/aip/journal/jap/53/4/10.1063/1.331021
10.1063/1.331021
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