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Influence of deposition conditions on hydrogenated amorphous silicon prepared by rf planar magnetron sputtering
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10.1063/1.332439
/content/aip/journal/jap/54/6/10.1063/1.332439
http://aip.metastore.ingenta.com/content/aip/journal/jap/54/6/10.1063/1.332439
/content/aip/journal/jap/54/6/10.1063/1.332439
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/content/aip/journal/jap/54/6/10.1063/1.332439
1983-06-01
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Influence of deposition conditions on hydrogenated amorphous silicon prepared by rf planar magnetron sputtering
http://aip.metastore.ingenta.com/content/aip/journal/jap/54/6/10.1063/1.332439
10.1063/1.332439
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