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Shallow junction cobalt silicide contacts with enhanced electromigration resistance
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10.1063/1.332940
/content/aip/journal/jap/55/10/10.1063/1.332940
http://aip.metastore.ingenta.com/content/aip/journal/jap/55/10/10.1063/1.332940
/content/aip/journal/jap/55/10/10.1063/1.332940
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/content/aip/journal/jap/55/10/10.1063/1.332940
1984-05-15
2014-10-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Shallow junction cobalt silicide contacts with enhanced electromigration resistance
http://aip.metastore.ingenta.com/content/aip/journal/jap/55/10/10.1063/1.332940
10.1063/1.332940
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