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Enhanced conduction and minimized charge trapping in electrically alterable read‐only memories using off‐stoichiometric silicon dioxide films
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10.1063/1.333291
/content/aip/journal/jap/55/8/10.1063/1.333291
http://aip.metastore.ingenta.com/content/aip/journal/jap/55/8/10.1063/1.333291
/content/aip/journal/jap/55/8/10.1063/1.333291
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/content/aip/journal/jap/55/8/10.1063/1.333291
1984-04-15
2015-03-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhanced conduction and minimized charge trapping in electrically alterable read‐only memories using off‐stoichiometric silicon dioxide films
http://aip.metastore.ingenta.com/content/aip/journal/jap/55/8/10.1063/1.333291
10.1063/1.333291
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