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Electron heating in silicon dioxide and off‐stoichiometric silicon dioxide films
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10.1063/1.334518
/content/aip/journal/jap/57/4/10.1063/1.334518
http://aip.metastore.ingenta.com/content/aip/journal/jap/57/4/10.1063/1.334518
/content/aip/journal/jap/57/4/10.1063/1.334518
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/content/aip/journal/jap/57/4/10.1063/1.334518
1985-02-15
2014-12-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electron heating in silicon dioxide and off‐stoichiometric silicon dioxide films
http://aip.metastore.ingenta.com/content/aip/journal/jap/57/4/10.1063/1.334518
10.1063/1.334518
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