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Density of gap states in chemical‐vapor‐deposited hydrogenated amorphous silicon films
1.S. C. Gau, B. R. Weinberger, M. Akhtar, Z. Kiss, and A. G. MacDiarmid, Appl. Phys. Lett. 39, 436 (1981).
2.F. B. Ellis, Jr. and R. G. Gordon, J. Appl. Phys. 54, 5381 (1983).
3.S. S. Hegedus, R. E. Rocheleau, and B. N. Baron, Proceedings of the 17th IEEE Photovoltaic Specialists Conference (IEEE, New York, NY, 1984), p. 239.
4.T. L. Chu, Shirley S. Chu, S. T. Ang, D. H. Lo, A. Duong, and C. G. Hwuang, J. Appl. Phys. 59, 1319 (1986).
5.W. B. Jackson, N. M. Amer, A. C. Boccara, and D. Fourmier, Appl. Opt. 20, 1333 (1981).
6.N. M. Amer and W. B. Jackson, in Semiconductors and Semimetals, Vol. 21, Part B, edited by J. I. Pankore, (Academic, Orlando, FL, 1984), p. 83.
7.J. D. Cohen and D. V. Lang, Phys. Rev. B 25, 5321 (1982).
8.K. D. Mackenzie, P. G. LeComber, and W. E. Spear, Philos. Mag. B 46, 377 (1982).
9.S. Ashok, A. Lester, and S. J. Fonash, IEEE Electron Device Lett. EDL‐1, 200 (1980).
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