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Surface stoichiometry, structure, and chemisorption on silicon nitride studied by direct recoiling, x‐ray photoelectron spectroscopy, and Auger electron spectroscopy
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10.1063/1.337122
/content/aip/journal/jap/60/7/10.1063/1.337122
http://aip.metastore.ingenta.com/content/aip/journal/jap/60/7/10.1063/1.337122
/content/aip/journal/jap/60/7/10.1063/1.337122
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/content/aip/journal/jap/60/7/10.1063/1.337122
1986-10-01
2014-11-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Surface stoichiometry, structure, and chemisorption on silicon nitride studied by direct recoiling, x‐ray photoelectron spectroscopy, and Auger electron spectroscopy
http://aip.metastore.ingenta.com/content/aip/journal/jap/60/7/10.1063/1.337122
10.1063/1.337122
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