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Effects of ion‐implantation damage on two‐dimensional boron diffusion in silicon
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10.1063/1.338117
/content/aip/journal/jap/61/4/10.1063/1.338117
http://aip.metastore.ingenta.com/content/aip/journal/jap/61/4/10.1063/1.338117
/content/aip/journal/jap/61/4/10.1063/1.338117
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/content/aip/journal/jap/61/4/10.1063/1.338117
1987-02-15
2014-09-23
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Scitation: Effects of ion‐implantation damage on two‐dimensional boron diffusion in silicon
http://aip.metastore.ingenta.com/content/aip/journal/jap/61/4/10.1063/1.338117
10.1063/1.338117
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