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Dopant redistribution at Si surfaces during vacuum anneal
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10.1063/1.338372
/content/aip/journal/jap/61/9/10.1063/1.338372
http://aip.metastore.ingenta.com/content/aip/journal/jap/61/9/10.1063/1.338372
/content/aip/journal/jap/61/9/10.1063/1.338372
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/content/aip/journal/jap/61/9/10.1063/1.338372
1987-05-01
2014-11-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Dopant redistribution at Si surfaces during vacuum anneal
http://aip.metastore.ingenta.com/content/aip/journal/jap/61/9/10.1063/1.338372
10.1063/1.338372
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