No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Radiation damage of gallium arsenide induced by reactive ion etching
1.W. K. Chu, J. W. Mayer, and M. A. Nicolet, Backscattering Spectrometry (Academic, New York, 1978), p. 255.
2.T. Hara and H. Suzuki, in Proceedings of the 16th Symposium on Ion Implantation and Submicron Fabrication, Tokyo, Japan (The Institute of Physical and Chemical Research, Tokyo, 1985), p. 169.
3.S. M. Sze, Physics of Semiconductor Devices, 2nd ed. (Wiley, New York, 1981), p. 246.
Article metrics loading...
Full text loading...
Most read this month
Most cited this month