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Hydrogen motion in thermally annealed sputter‐deposited hydrogenated amorphous silicon
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10.1063/1.339675
/content/aip/journal/jap/62/4/10.1063/1.339675
http://aip.metastore.ingenta.com/content/aip/journal/jap/62/4/10.1063/1.339675
/content/aip/journal/jap/62/4/10.1063/1.339675
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/content/aip/journal/jap/62/4/10.1063/1.339675
1987-08-15
2014-09-03
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hydrogen motion in thermally annealed sputter‐deposited hydrogenated amorphous silicon
http://aip.metastore.ingenta.com/content/aip/journal/jap/62/4/10.1063/1.339675
10.1063/1.339675
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