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Predicting thin‐film stoichiometry in reactive sputtering
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10.1063/1.340030
/content/aip/journal/jap/63/3/10.1063/1.340030
http://aip.metastore.ingenta.com/content/aip/journal/jap/63/3/10.1063/1.340030
/content/aip/journal/jap/63/3/10.1063/1.340030
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/content/aip/journal/jap/63/3/10.1063/1.340030
1988-02-01
2014-10-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Predicting thin‐film stoichiometry in reactive sputtering
http://aip.metastore.ingenta.com/content/aip/journal/jap/63/3/10.1063/1.340030
10.1063/1.340030
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