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Interactions of thin Ti films with Si, SiO2, Si3N4, and SiO x N y under rapid thermal annealing
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10.1063/1.341434
/content/aip/journal/jap/64/1/10.1063/1.341434
http://aip.metastore.ingenta.com/content/aip/journal/jap/64/1/10.1063/1.341434
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/content/aip/journal/jap/64/1/10.1063/1.341434
1988-07-01
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Interactions of thin Ti films with Si, SiO2, Si3N4, and SiOxNy under rapid thermal annealing
http://aip.metastore.ingenta.com/content/aip/journal/jap/64/1/10.1063/1.341434
10.1063/1.341434
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